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簡要描述:硫化鍺晶體(tǐ) GeS(Germanium Sulfide)
晶體(tǐ)尺寸:~10毫米
電(diàn)學性能:半導體(tǐ)
晶體(tǐ)結構:斜方晶系
晶胞參數:a = 1.450, b = 0.364 nm, c = 0.430 nm, α = β = γ = 90°
晶體(tǐ)類型:合成
晶體(tǐ)純度:>99.995%
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硫化鍺晶體(tǐ) GeS(Germanium Sulfide)
晶體(tǐ)尺寸:~10毫米
電(diàn)學性能:半導體(tǐ)
晶體(tǐ)結構:斜方晶系
晶胞參數:a = 1.450, b = 0.364 nm, c = 0.430 nm, α = β = γ = 90°
晶體(tǐ)類型:合成
晶體(tǐ)純度:>99.995%
X-ray diffraction on a single crystal GeS aligned along the (001) plane. XRD was performed at room temperature using a D8 Venture Bruker. The 4 XRD peaks correspond, from left to right, to (h00) with h = 2, 4, 6, 8
Powder X-ray diffraction (XRD) of a single crystal GeS. X-ray diffraction was performed at room temperature using a D8 Venture Bruker.
Stoichiometric analysis of a single crystal GeS by Energy-dispersive X-ray spectroscopy (EDX).
Raman spectrum of a single crystal GeS. Measurement was performed with a 785 nm Raman system at room temperature.
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